Nanometer scale patterning using focused ion beam milling

D. Petit, C. C. Faulkner, S. Johnstone, David Wood, R. P. Cowburn

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)


We report on the performance of focused ion beam (FIB) milling in order to produce nanometer scale devices. Resolution issues have been systematically studied as a function of emission current and working distance, by imaging single pixel lines FIB milled into thin bismuth films deposited on oxidized silicon. The ion beam profile has been measured, and by carefully optimizing the milling conditions, 40 nm Hall probe sensors have been fabricated.
Original languageEnglish
Pages (from-to)026105
Number of pages1
JournalReview of Scientific Instruments
Issue number2
Publication statusPublished - 1 Feb 2005


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